We work on open innovation for semiconductors. We engage in AIST’s advanced semiconductor projects as well as the fabrication services for the requests from organizations outside AIST. Our facility is operated under the clean conditions and metal contamination controls, which are equivalent to those of a mass-production semiconductor factory using 300 mm silicon wafers. CMOS devices, silicon photonics devices, and Cu-wiring structures are fabricated on our process platform.
A silicon substrate with the diameter of 300 mm (the mainstream in semiconductor mass production)
Contamination/adhesion of undesirable metal in/on wafers during semiconductor processes
Extarnal website:産総研スーパークリーンルーム(SCR) (aist.go.jp)