CMOS Integration
Research Team


CMOS Integration Research TeamAbout

Technology in single-nanometer precision.

A semiconductor chip, commonly known as a Large-Scale Integrated (LSI) circuit, consists of complementary metal-oxide-semiconductor field-effect transistors (CMOS), comprising both positive-type and negative-type transistors. CMOS devices are continually miniaturized year by year. Presently, state-of-the-art LSI chips integrate billions of transistors, transforming their structure from a 2-dimensional planar type to 3-dimensional gate-all-around structures. Amid the era of the increasingly complex CMOS manufacturing processes described above, the CMOS Integration team is focused on creating groundbreaking technologies which are applicable to a few chip generations at Super Clean Room in AIST-WEST, Tsukuba.

CMOS Integration Research TeamKeywords

gate-all-around

GAA

2nm process

nanosheet

CMOS

CMOS Integration Research TeamResearch Topic

Advanced process technologies for GAA nanosheet CMOS

This schematic illustrates the typical structure of a gate-all-around (GAA) nanosheet CMOS in a 2-nanometer chip technology. Within this design, you can find a couple of nanosheets through which either electrons or holes run. These ultrathin ribbons are surrounded by the metal gate electrode (MG) and the high-k gate dielectric beneath the MG. Recently, we have introduced a variety of state-of-the-art manufacturing tools for advanced lithography, selective epitaxial growth, atomic-layer deposition, and highly selective etching. We are developing advanced process technologies for GAA nanosheet CMOS by leveraging these workhorses.

CMOS Integration Research TeamFacility

Super Clean Room(SCR)

Extarnal website:Super Clean Room(SCR) 

ArF immersion lithography equipment
Scene inside SCR
300 mm silicon wafers

CMOS Integration Research TeamTeam Members

OTA Hiroyuki
TeamLeader
KASASHIMA Yuji
SANTILLAN Julius
HIROSHIMA Hiroshi
Invited Senior Researcher
ASANUMA Shutaro
Adjunct
ITANI Toshiro
Adjunct
OCHIAI Takao
Adjunct
KONOTO Makoto
Adjunct
SUZUKI Kenta
Adjunct
TANIGUCHI Asako
Adjunct
FUKASAWA Masanaga
Adjunct
YOUN SungWon
Adjunct

Research Team

National Institute of Advanced Industrial Science and Technology(AIST)
Semiconductor Frontier Research Center

16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan  [Access]
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