51
Vol.3, No.4
February 2005
page 489
研究報告(Research Papers)
Bilateral comparison of pressure sensitivities of laboratory standard microphones between NMIJ and NIMT
National Institute of Advanced Industrial Science and Technology
National Metrology Institute of Japan
51
Vol.3, No.4
February 2005
page 489
研究報告(Research Papers)
Bilateral comparison of pressure sensitivities of laboratory standard microphones between NMIJ and NIMT
52
Vol.3, No.4
February 2005
page 495
研究報告(Research Papers)
Development of an Intensity Stabilized Laser System with Frequency Offset of 9.2GHz
53
Vol.3, No.4
February 2005
page 499
研究報告(Research Papers)
Pitch Measurement of 150 nm 1D-grating Standards Using an Nano-metrological Atomic Force Microscope
54
Vol.3, No.4
February 2005
page 507
研究報告(Research Papers)
Rubidium-stabilized diode laser for high-precision interferometer
55
Vol.3, No.4
February 2005
page 511
研究報告(Research Papers)
Thermal Conductivity and Thermal Diffusivity of Twenty-Nine Liquids: Alkenes, Cyclic (Alkanes, Alkenes, Alkadienes, Aromatics), and Deuterated Hydrocarbons
56
Vol.3, No.4
February 2005
page 529
研究報告(Research Papers)
Hardening Mechanisms of Amorphous / Polycrystalline Nanostructured Multilayer Films: Si3N4/CrN and Si3N4/TiN
57
Vol.3, No.4
February 2005
page 535
研究報告(Research Papers)
What happens in the annealing of carbon nitride thin films?
58
Vol.3, No.4
February 2005
page 541
研究報告(Research Papers)
Nanoscale structural change in a sputter-deposited SiO2/a-Si/SiO2 sandwich
59
Vol.3, No.4
February 2005
page 545
研究報告(Research Papers)
Suppression of interfacial diffusion by a predeposited Hf metal layer on SO2/Si
60
Vol.3, No.4
February 2005
page 551
技術資料(Technical Report)
A Survey on Time/Frequency Transfer and Dissemination Techniques Using Optical Fiber
61
Vol.3, No.4
February 2005
page 559
技術資料(Technical Report)
A survey on micro metrology for dimensional standard
62
Vol.3, No.4
February 2005
page 569
技術資料(Technical Report)
A survey of a power uprate in a commercial nuclear power plant and a water flow facility for calibration standard
63
Vol.3, No.4
February 2005
page 587
技術資料(Technical Report)
Review of Alternating Current Ratio Standards
64
Vol.3, No.4
February 2005
page 599
技術資料(Technical Report)
Recent progress and future prospects for highly accurate measurement methods in millimeter-wave antenna standards
65
Vol.3, No.4
February 2005
page 609
技術資料(Technical Report)
A survey on RF attenuation standand
66
Vol.3, No.4
February 2005
page 625
技術資料(Technical Report)
A survey of RF & microwave impedance standands
67
Vol.3, No.4
February 2005
page 633
技術資料(Technical Report)
A survey on development and establishment of absorbed dose standands for beta radiaton
68
Vol.3, No.4
February 2005
page 643
技術資料(Technical Report)
A survey on highly sensitive gas analysis for standard gas preparation
69
Vol.3, No.4
February 2005
page 657
技術資料(Technical Report)
A Survey on Measurement Technique to Establish and Supply pH Primary Standard
70
Vol.3, No.4
February 2005
page 667
技術資料(Technical Report)
A survey on speciation reference materials
71
Vol.3, No.4
February 2005
page 689
技術資料(Technical Report)
A Survey on Thickness Measurements and Standards for Ultra-thin Films