Equipment
Achievements
How to use
Access
Device
Deposition
Lithography/ Cleaning
Etching/ Planarization
Observation/ Measurement
Etching/ Planarization
水平方向にスクロールできます。
Device name
Model
Specification
CMP system
Tokyo Seimitsu Co., Ltd. ChaMP
Fluorine-based ICP-RIE
Samco RIE-400iP4
ICP-RIE machine
Samco RIE-400iP3
ICP-RIE machine
Ulvac CE-300I
Parallel Plate RIE
Samco RIE-200L
Parallel Plate RIE
Ulvac CE-300R
Parallel Plate RIE
Samco RIE-10NR
Ion Milling System
RMTec J-500L
Ashing system
Canon MAS-8220AT