|
Device name |
Model |
Specification |
![Cluster-type Sputtering System](image/image37.jpg) |
Cluster-type Sputtering System |
Ulvac SME-200J |
|
![Nb-AI Josephson junction (JJ) fabrication system](image/image01.jpg) |
Nb-AI Josephson junction (JJ) fabrication system |
Science plus M93-0012 |
|
![Nb-AI Josephson junction (JJ) fabrication system](image/image02.jpg) |
Nb-AI Josephson junction (JJ) fabrication system |
Seed Lab., Corporation M97-0014 |
|
![TEOS-CVD](image/image04.jpg) |
TEOS-CVD |
Samco PD-270STL-AI |
|
![Oblique angle deposition system](image/image08.jpg) |
Oblique angle deposition system |
PLASSYS |
|
![Plasma-Enhanced Atomic Layer Deposition(PE-ALD) system](image/image07.jpg) |
Plasma-Enhanced Atomic Layer Deposition(PE-ALD) system |
Samco AD-230LP |
|
![Multi-target (HEX) sputtering system](image/image06.jpg) |
Multi-target (HEX) sputtering system |
EIKO ENGINEERING LTD. ES-350 |
|
![Insulating film fabrication system](image/image05.jpg) |
Insulating film fabrication system |
Seed Lab., Corporation M98-0021 |
|