Theme
Research on flexible transparent conductive films
Research keywords
Photo irradiation, Solid phase crystallization, Transparent conductive oxide, Carrier transport, Magnetron sputtering, Ion plating
Research Objectives
In this work, we have been developing for fabrication technology to realize high-quality flexible transparent conductive oxide (TCO) thin films. The development of technology that enables the crystallization of TCO precursor thin films and the activation of dopants on flexible substrates, which cannot be subjected to high temperatures, without thermal damage to the substrate, is expected to achieve high electrical conductivity and high optical transparency on flexible substrates.
Research Results
To achieve the above purpose, we apply photo irradiation technology that can control thermal and chemical effects by wavelength and pulse width, and deposition technology to improve the quality of precursor thin films by various plasma vapor deposition processes.
Links(external publications, patents, related news, etc.)
- “Over 130 cm2/Vs Hall mobility of flexible transparent conductive In2O3 films by excimer-laser solid-phase crystallization”, Junichi Nomoto, Takashi Koida, Iwao Yamaguchi, Hisao Makino, Yuuki Kitanaka, Tomohiko Nakajima, Tetsuo Tsuchiya, NPG Asia Mater. 14, 76 (2022); doi: 10.1038/s41427-022-00421-4
- ”Origin of simultaneous enhancement of work function and carrier concentration in In2O3 films by excimer-laser irradiation”, Junichi Nomoto, Hiroaki Matsui, Iwao Yamaguchi, Tomohiko Nakajima, and Tetsuo Tsuchiya, Appl. Phys. Lett. 118, 101602 (2021); doi: 10.1063/5.0041353
- ”Excimer laser annealing method for achieving low electrical resistivity and high work function in transparent conductive amorphous In2O3:Zn films on a polyethylene terephthalate substrate”, Junichi Nomoto, Iwao Yamaguchi, Tomohiko Nakajima, Yasuhito Matsubayashi, and Tetsuo Tsuchiya, Thin Solid Films 698, 137867 (2020); doi: 10.1016/j.tsf.2020.137867