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Qufab foundry is now accepting applications for its 2nd run of FY2026.
Qufab is a cleanroom facility at AIST dedicated to the fabrication of superconducting devices. We are offering six runs each of the PHSTP and 1KP processes throughout FY2026.
For details on the application procedure, please visit here.
If you are interested in our fabrication services, please don’t hesitate to contact us.

Eligibility for FY2026

 For research purposes only (Domestic and international organizations, public institutions, and private companies)

Deadline (2nd run)

 Deadline for application: Sun, May 31, 2026
 Deadline for design data: Tue., June 30, 2026 (PHSTP, 1KP)

Price

 Please contact us for information on pricing.

Specifications

PHSTP Process 4-Nb layers
Nb/Al-AlOx/Nb Josephson junction layer
Mo resistor layer
Planarized SiO2 interlayer dielectric
Minimum line width is 1.0 µm
Minimum Josephson junction (JJ) is 1.0 µm square
Critical current density of JJ (Jc) is 10 kA/cm2
Sheet resistance is 2.4 Ω
Chip size: 7.1 x 7.1 mm


S. Nagasawa et al., IEICE Trans. Electron., vol. E104-C, no.9, pp. 435–445, Sep. 2021.
1KP Process 4-Nb layers
Nb/Al-AlOx/Nb Josephson junction layer
Pd resistor layer
Planarized SiO2 interlayer dielectric
Minimum line width is 1.0 µm
Minimum Josephson junction (JJ) is 1.0 µm square
Critical current density of JJ (Jc) is 1 kA/cm2
Sheet resistance is 1.2 Ω
Chip size: 5.0 x 5.0 mm


T. Yamae et al., Sci. Rep., vol. 15, 41429, 2025..

Contact

M-Qufab-foundry-ml*aist.go.jp
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