P309
Near IR (NIR) Laser-Induced Etching of Dye-doped Polymer Thin Films
Norimasa Fukazawa,
Chyongjin Pac
Kawamura Institute of Chemical Research
We investigated NIR-laser (1064 nm) etching behavior of polymer thin films doped with an NIR-absorbing dye
involving the dynamic processes and etched-surface morphology. Time-resolved photographic analysis for
laser-pulse irradiation of dye-doped polystyrene films showed the liberation of a large block of materials
in the case of Ni(dmit)2 but the spray-like ejection of small fragments in the case of IRG-022. These dynamic
features in the etching processes were associated with etched surface morphologies. It was found that the
irradiated spot of Ni(dmit)2-doped film was cleanly etched and simultaneously produced a polymer flyer
without significant disorder of the etching image. For IRG-022/polymer systems, on the other hand, the etched
crater was surrounded by melted rim and fibrous debris, as the consequence of explosive fragmentation of the
irradiated spot.
In conclusion, high quality etching of polymer thin films can be carried out by selecting adequate
dye/polymer systems, even by NIR laser pulse irradiation.
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