P305
Laser ablation of polyarylsulfone films: a laser ionization TOF mass spectrometric study
Christos Grivas, Hiroyuki Niino, Akira Yabe
NIMC
Laser ionization time-of-flight (TOF) mass spectrometry has been
employed to probe the dynamics of ablation of polyarylsulfone (PAS)
with a KrF excimer laser at 248 nm. Neutral products arriving at an
ion extraction position were detected by delaying a post-ionization laser
pulse (ArF excimer laser) with respect to an ablation laser pulse.
The distribution, the velocities, and the yields of major products were
analyzed for an interpretation of ablation mechanism.
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