Innovative Plasma Processing Group

Group Outline and Primary Goal

We pursue research and development of innovative energy-saving and low environmental impact electronic devices through advanced plasma process technology. As such, we contribute to achieve a safe and secure super-aging society.

Key Themes of Research

1. Research and Development of novel processing technologies;
 1-1. production of low temperature high-density nitrogen radicals under quasi-atmospheric pressure

  * green and red LED device manufacturing
  * nitrogen passivation of chemical compounds
 1-2. large area and high-throughput surface treatment by damage less low temperature plasma processes under the  atmospheric pressure (ref. Figure 1)
 1-3. production of carbon materials

  * production of high-quality graphene film (one to a few layers) under low temperature
   (for high heat dissipation material on the multilayer integrated circuit)
  * production of single layer diamond, and nano diamond under low temperature
   development of pure carbon plasma source
 1-4. development of high-power green laser
  * modeling using numerical simulation (???)

2. Research and Development of life science;
  * International standardization of low energy ionized gas haemostasis equipment (IEC / TC 62 - SC 62D – MT 34)
  * controlling of radicals in the plasma treated liquids
  * development of near infrared imaging device
  * drag manufacturing study for cancer treatment using low energy and high reactive plasma technology

3. Seeds Research
  * development of ultra-miniature plasma thruster for ultra-miniature satellite

Fig1.Next-generation microstrip line type of microwave process tools capable of low-temperature atmospheric pressure plasma treatment using various gases at high speed, mass processing, low cost, low power, compact size, and long life.

Fig.2 Minimally invasive plasma hemostasis equipment for open surgery.

Our Technologies and Equipment

  • Plasma production technologies under the low, middle, or high pressure region, plasma production technologies based on the solid material (without using gas and liquid), ion beam technologies, pulsed electron beam technologies, numerical simulation technique, and diagnostics
  • Plasma equipment under the low, middle, or high pressure region, Raman microscopy, XRD, ESR, TOF-MASS, spectrometers (UV, visible, near-infrared), infrared camera, ion beam system, YAG laser and high voltage power supplies


・Jaeho Kim, Hajime Sakakita, Hiroyuki Osaki, and Makoto Katsurai, “Microwave-excited atmospheric pressure plasma jet with wide aperture for the synthesis of carbon nanomaterials”,Japanese Journal of Applied Physics 54, pp.01AA02 (2015/01).
・S. Kato, S. Kurimura, H. H. Lim, and N. Mio, “Induced heating by nonlinear absorption in LiNbO3-type crystals under continuous-wave laser irradiation“, Optical Materials 40, 10-13 (2015).
・Yutaka Fujiwara, Hajime Sakakita, Hiromasa Yamada, Yusuke Yamagishi, Hirotomo Itagaki, Satoru Kiyama, Masaori, Fujiwara, Yuzuru Ikehara, and Jaeho Kim, “Observations of multiple stationary striation phenomena in an atmospheric pressure neon plasma jet”, Japanese Journal of Applied Physics 55-010301, pp.1-4 (2015).
・Hirotomo Itagaki, Shingo Hirose, Jaeho Kim, Mutsuo Ogura, X.-L. Wang, Atsushi Nonaka, Hisato Ogiso, and Hajime Sakakita, “A low power nitriding technique utilizing a microwave excited radical flow”, Japanese Journal of Applied Physics 55, 6S2 (2016) 1-5.
・Hiromasa Yamada, Hajime Sakakita, Susumu Kato, Jaeho Kim, Satoru Kiyama, Masanori Fujiwara, Hirotomo Itagaki, Toshiya Okazaki, Sanae Ikehara, Hayao Nakanishi, Nobuyuki Shimizu and Yuzuru Ikehara, “Spectroscopy of reactive species produced by low-energy atmospheric-pressure plasma on conductive target material surface”, J. Phys. D: Appl. Phys. 49, 394001 (2016) 1-11.
・Hiromasa Yamada, Tetsuji Shimizu, Masanori Fujiwara, Susumu Kato, Yutaka Fujiwara, Hirotomo Itagaki, Satoru Kiyama, Jaeho Kim, Sanae Ikehara, Nobuyuki Shimizu Hayao Nakanishi, Yuzuru Ikehara, and Hajime Sakakita, “Measurements of emission-propagation phenomena in low-energy atmospheric-pressure helium plasma, PLASMA SOURCES SCIENCE & TECHNOLOGY 27 (2018) 05LT02 (5pp).
・K. Takeda, H. Sakakita, Y. Ikehara, M. Hori, et al., “Systematic diagnostics of the electrical, optical, and physicochemical characteristics of low-temperature atmospheric-pressure helium plasma sources”, JOURNAL OF PHYSICS D-APPLIED PHYSICS, 52-165202, pp.1-13 (2019). ・J. Kim, H. Sakakita, H. Itagaki, “Low-temperature graphene growth by forced convection of plasma-excited radicals”, NANO LETTERS 19, pp.739-746 (2019).
・Susumu Kato, Atsushi Sunahara, and Masahiro Tsukamoto, ”Kinetic model for color-center formation in TiO2 film using femtosecond laser irradiation”, Journal of Vacuum Science & Technology A 37, 031512 (2019).
・Y. Hirano, Y. Fujiwara, S. Kiyama, Y. Adachi, and H. Sakakita, ”Measurements of beam current density and space potential in a highly focused ion beam of extremely low energy”, Plasma Sources Sci. Technol. 28, 065010-1 - 065010-14 (2019).
・H. Itagaki, Y. Fujiwara, Y. Minowa, Y. Ikehara, T. Kaneko, T. Okazaki, Y. Iizumi, J. Kim, and H. Sakakita, “Synthesis of endohedral-fullerenes using laser ablation plasma from solid material and vaporized fullerenes”, American Institute of Physics Advances 9, 075324-1-075324-9 (2019).